Boron Based Nanomaterials
SUNUM has, ISO 14644 Certified Class 100-1.000-10.000 (ISO 5,6,7) cleanrooms to perform micro and nanofabrication processes such as photolithography, electron beam lithography, reactive ion etching, thermal evaporation, e-beam evaporation and sputtering.
With its expert technical staff, SUNUM provides microfabrication & nanofabrication services on varies material and substrates covers for a wide field of application areas such as communication, health, defense, environment, energy, and also provides advanced hands on training with the state of the art equipments in ISO 14644 certified cleanrooms.
Our microfabrication & nanofabrication laboratories provides custom design fabrication, infrastructure, state of the art equipment to use, and staff support necessary to enable faculty, students, academic and corporate partners to conduct competitive research in the growing number of fields that rely on microfabrication & nanofabrication.
Focused Ion Beam (FIB) is a type of electron microscope, which uses “focused ions”to scan over the sample. This tool is similar to a Scanning Electron Microscope, however since it uses massive ions (usually Ga+) for scanning, it allows for processing of the samples due to ion-material interactions, resulting in “ion milling” based applications.
Usually Focused Ion Beam (FIB)and SEM columns are together in one platform, so called “dual-beam” or “multi-beam” systems, and hence ion and electron processing/imaging can be performed simultaneously.